HSQ-Based Fabrication of Magnetic Nanopillars
نویسندگان
چکیده
Hydrogen silsesquioxane (HSQ) has been used as e-beam resist and ion milling mask in the fabrication of spin valve devices. The excellent performance of HSQ in patterning nanometer size features and corresponding procedures such as chemical mechanical polishing (CMP) make the HSQ-based process a reliable and economic way to make nanomagnetic devices.
منابع مشابه
High resolution HSQ nanopillar arrays with low energy electron beam lithography
0167-9317/$ see front matter 2013 Elsevier B.V. A http://dx.doi.org/10.1016/j.mee.2013.03.055 ⇑ Corresponding author at: LAAS, CNRS, 7 avenue Toulouse, France. Tel.: +33 (0) 5 61 33 79 84; fax: +3 E-mail addresses: [email protected] (Y. Guerfi), glarri Electron beam lithography (EBL) is commonly used for the fabrication of nanostructures by top-down approach with precise control of size, shape, a...
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